WASHINGTON, DC—The National Law Journal named Finnegan partner Danny M. Awdeh a 2017 D.C. Rising Star. The Rising Stars list honors a select group of attorneys under the age of 40, who are making an impact in their respective areas of law and have repeatedly achieved high-stakes victories.
Danny is an experienced trademark lawyer who serves an international clientele on a wide variety of trademark issues, with a focus on litigation, disputes, global portfolio management, and strategic counseling. He routinely represents some of the world's most recognized brands in high-stakes litigation in federal district, state, and appellate courts as well as before the Trademark Trial and Appeal Board (TTAB). In addition to obtaining favorable outcomes for firm clients, Danny has negotiated countless business-oriented solutions tailored to the needs of clients' global business and legal objectives.
Danny cites wins for Bridgestone and Under Armour as his biggest accomplishments. He credits Finnegan's former and current trademark practice group leaders—Larry Hefter and Douglas Rettew—as incredible mentors.
Mark D. Sweet, Managing Partner
James B. Monroe, Chair
About The National Law Journal
The National Law Journal provides in-depth coverage of the issues that mean the most to private practitioners, judges, corporate lawyers, government attorneys and other members of the legal community.
Finnegan, Henderson, Farabow, Garrett & Dunner, LLP is one of the largest IP law firms in the world. From offices in Atlanta, Boston, London, Palo Alto, Reston, Seoul, Shanghai, Taipei, Tokyo, and Washington, DC, the firm practices all aspects of patent, trademark, copyright, and trade secret law, including counseling, prosecution, licensing, and litigation. Finnegan also represents clients on IP issues related to European patents and trade marks, international trade, portfolio management, the Internet, e-commerce, government contracts, antitrust, and unfair competition. For additional information on the firm, please visit www.finnegan.com. Follow us on LinkedIn and Twitter.
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