Advanced IP Workshop—Recent Developments in U.S. Patent Licensing and Litigation

Finnegan’s Shanghai Office cordially invites you to attend the next event of its exclusive Advanced Intellectual Property Seminar Program series featuring Finnegan partners, D. Patrick O’Reilley, Ningling Wang, and Qingyu Yin, who will discuss recent developments in U.S. patent law and what they mean for Chinese companies.

U.S. patent law has recently undergone dramatic changes. Chinese companies doing business in the United States should understand these changes and take advantage of them. For example, the U.S. Supreme Court has made it clear that it is patent misuse if patentees charge royalties for patents after the patents expire.

The growing popularity of challenging patent validity in the U.S. Patent and Trademark Office is also good news, especially in terms of addressing threats from competitors. Companies can defend themselves without undergoing the expense of full lawsuits.

The Supreme Court also made it easier to find certain patents invalid for indefiniteness and patent ineligible subject matter. Chinese companies can use this knowledge to assist with their strategic planning and license negotiations by giving them realistic appreciation of risks they face with patent infringement.

The principal purpose of this seminar is to bring knowledge of these recent cases in the U.S. with helpful suggestions and guidance to companies doing business in the U.S. Please join us for this seminar.

Agenda:
13:00 - 13:30 Registration
13:30 - 14:10 Welcome Remarks and Summary of Recent Developments in U.S. Patent Law
14:10 - 14:55 Recent Developments in Litigation
14:55 - 15:10 Tea Break
15:10 - 16:30 Recent Developments in Licensing
16:30 - 17:00 Questions & Answers

RSVP:
RSVP by September 16, 2015 to email.
For more information, please contact us at
021-61942067
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