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Charles H.Y. Huang Ph.D.
202.408.6052
charles.huang@finnegan.com

901 New York Avenue, NW
Washington, DC 20001-4413

202.408.4000
Fax 202.408.4400

Bar and Court Admissions

  • U.S. Patent and Trademark Office
  • U.S. Patent and Trademark Office: Limited recognition to practice before the U.S. Patent and Trademark Office

Education

  • Catholic University of America, Columbus School of Law
    J.D., expected 2014
  • National Tsing Hua University, Hsinchu, Taiwan
    Ph.D., Materials Science and Engineering, 2000
  • National Tsing Hua University, Hsinchu, Taiwan
    M.S., Materials Science and Engineering, 1996
  • National Tsing Hua University, Hsinchu, Taiwan
    B.S., Materials Science and Engineering, 1994

Languages

  • Mandarin Chinese

Charles H.Y. Huang Ph.D.

Student Associate

Charles Huang is involved in preparing patent applications, assisting in patent prosecution, providing technical analysis used in developing strategic advisory and legal opinions, and supporting the firm’s United States patent litigation practice. He obtained his Ph.D. in materials science, with particular focus on optoelectronic devices and related semiconductor technologies.

Prior to joining Finnegan, Dr. Huang worked as an intellectual property manager for liquid crystal display manufacturing companies in Taiwan and mainland China. In these positions, he was responsible for analyzing several LCD-related patent portfolios, supervising litigation relating to U.S. patent rights, and negotiating patent acquisitions. He previously served as a senior engineer in support of the development and manufacturing of wide viewing angle LCDs.

Dr. Huang is particularly knowledgeable regarding the interpretation of analytical results obtained from instruments employed in materials science research. He served as chief assistant, instrument center, at Taiwan’s National Science Counsel, with responsibility for operating an atomic resolution electron microscope. His graduate research at National Tsing Hua University related to the interfacial reaction between metal thin films and semiconductors, and its applications in ultra large scale integrated circuits.

Professional Activities

  • The Chinese Society for Materials Science
  • Microscopy Society, Taipei